Keyword | CPC | PCC | Volume | Score | Length of keyword |
---|---|---|---|---|---|
plasma etch | 1.65 | 0.7 | 5377 | 43 | 11 |
plasma | 0.26 | 0.1 | 5398 | 35 | 6 |
etch | 0.27 | 1 | 616 | 25 | 4 |
Keyword | CPC | PCC | Volume | Score |
---|---|---|---|---|
plasma etching | 1.49 | 1 | 8191 | 63 |
plasma etching process | 0.56 | 0.7 | 1205 | 77 |
plasma etching machine | 0.27 | 0.8 | 4815 | 95 |
plasma etch chamber | 0.97 | 0.7 | 9318 | 91 |
plasma etch process engineer tel | 0.17 | 0.9 | 2573 | 45 |
plasma etching difference sf6 and cf4 | 0.16 | 0.3 | 8270 | 1 |
plasma etch jobs | 1.87 | 0.7 | 2914 | 99 |
plasma etching yesterday today and tomorrow | 0.88 | 1 | 8885 | 84 |
plasma etch oxygen and argon difference | 0.4 | 0.2 | 3048 | 12 |
plasma etching in semiconductor fabrication | 1.99 | 0.5 | 7252 | 9 |
plasma etching chamber | 1 | 0.4 | 7599 | 83 |
plasma etch inc | 0.67 | 0.1 | 8709 | 35 |
plasma etch process | 0.73 | 0.6 | 6180 | 57 |
what is plasma etching | 1.89 | 0.6 | 1902 | 19 |
inductively coupled plasma etching | 1.92 | 0.9 | 2743 | 68 |
low temperature plasma etching | 1.81 | 0.2 | 6429 | 31 |
oxygen plasma etching | 1.9 | 0.1 | 1525 | 71 |
tel plasma etch | 0.8 | 0.1 | 3008 | 90 |
plasma etching uniformity edge | 0.71 | 0.9 | 3270 | 55 |
plasma etching mechanism | 1.52 | 0.6 | 1123 | 31 |
plasma etching edge high | 0.24 | 0.7 | 6245 | 62 |
plasma etching scheme | 1.23 | 1 | 8729 | 53 |
plasma etching gas | 0.61 | 0.4 | 5794 | 31 |
plasma etching simulation | 1 | 0.8 | 5425 | 100 |
plasma etching: an introduction | 1.94 | 0.4 | 6993 | 36 |